18687069. ELECTRODE-DIELECTRIC NOZZLE FOR PLASMA PROCESSING (Lam Research Corporation)
ELECTRODE-DIELECTRIC NOZZLE FOR PLASMA PROCESSING
Organization Name
Inventor(s)
Paul Konkola of West Linn OR US
Shaun Tyler Smith of Portland OR US
Yukinori Sakiyama of West Linn OR US
Karl Frederick Leeser of West Linn OR US
Ramkishan Rao Lingampalli of Danville CA US
ELECTRODE-DIELECTRIC NOZZLE FOR PLASMA PROCESSING
This abstract first appeared for US patent application 18687069 titled 'ELECTRODE-DIELECTRIC NOZZLE FOR PLASMA PROCESSING
Original Abstract Submitted
Systems and device for removing edge bead accumulated on an edge of a wafer includes a first electrode disposed in a center of a nozzle used within a process chamber and a second electrode embedded within a dielectric material that surrounds the first electrode. A first channel is defined between the first electrode and the dielectric material and is used to receive a first gas from a first gas source. A second channel is defined between the dielectric material and an outer wall of the nozzle and is used to receive a second gas. RF power source is coupled to the nozzle so as to provide RF power to the electrodes to generate plasma radicals of the first gas. An opening at a bottom of the nozzle is used to provide pressurized flow of plasma radicals toward an edge of the wafer positioned below the nozzle.