18676686. SEMICONDUCTOR DEVICES AND METHOD OF MANUFACTURING THE SAME (Samsung Electronics Co., Ltd.)
SEMICONDUCTOR DEVICES AND METHOD OF MANUFACTURING THE SAME
Organization Name
Inventor(s)
Donggwan Shin of Suwon-si (KR)
Myunggil Kang of Suwon-si (KR)
SEMICONDUCTOR DEVICES AND METHOD OF MANUFACTURING THE SAME
This abstract first appeared for US patent application 18676686 titled 'SEMICONDUCTOR DEVICES AND METHOD OF MANUFACTURING THE SAME
Original Abstract Submitted
A semiconductor device includes an active region that extends on the substrate in a first direction; a plurality of semiconductor layers disposed on the active region and that are spaced apart from each other in a vertical direction perpendicular to an upper surface of the substrate; a gate structure disposed on the substrate and that crosses the active region and the plurality of semiconductor layers, surrounds each of the plurality of semiconductor layers, and extends in a second direction; a source/drain region disposed on at least one side of the gate structure and in contact with a portion of the plurality of semiconductor layers; and an epitaxial layer that is spaced apart from an uppermost semiconductor layer, is disposed below the source/drain region and between the active region and the source/drain region, and is in contact with at least a portion of the side surfaces of the lowermost semiconductor layer.