18673669. EXHAUST SYSTEM WITH U-SHAPED PIPES simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.)

EXHAUST SYSTEM WITH U-SHAPED PIPES

Organization Name

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor(s)

Yu-Fu Lin of Hsinchu (TW)

Shih-Chang Shih of Tainan City (TW)

Chia-Chen Chen of Hsinchu City (TW)

EXHAUST SYSTEM WITH U-SHAPED PIPES - A simplified explanation of the abstract

This abstract first appeared for US patent application 18673669 titled 'EXHAUST SYSTEM WITH U-SHAPED PIPES

Simplified Explanation: The patent application describes an exhaust system for removing hazardous gases from semiconductor manufacturing equipment.

• The system includes a main exhaust pipe, a first branch pipe connected to a gas mixture source, a second branch pipe connected to a gas box, and a detector to detect the hazardous gas downstream from the gas box.
• The first and second branch pipes connect to the main exhaust pipe at different locations, with the first location being more upstream than the second location.

Key Features and Innovation:

• Main exhaust pipe above semiconductor equipment
• First branch pipe connected to gas mixture source
• Second branch pipe connected to gas box
• Detector to detect hazardous gas
• Different connection locations on main exhaust pipe

Potential Applications:

• Semiconductor manufacturing industry
• Chemical processing plants
• Industrial manufacturing facilities

Problems Solved:

• Efficient removal of hazardous gases
• Enhanced safety in manufacturing environments

Benefits:

• Improved air quality
• Reduced health risks for workers
• Compliance with safety regulations

Commercial Applications: Exhaust systems like this could be used in semiconductor manufacturing plants, chemical processing facilities, and other industrial settings to ensure the safe removal of hazardous gases.

Questions about Exhaust Systems: 1. How does the placement of the detector downstream from the gas box enhance safety measures? 2. What are the potential cost savings associated with using this exhaust system in semiconductor manufacturing plants?

Original Abstract Submitted

An exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas includes: a main exhaust pipe above the semiconductor manufacturing equipment and having a top surface on a first side and a bottom surface on a second side, a first branch pipe connected to a source of a gas mixture containing the hazardous gas on the second side and connected to the main exhaust pipe through the top surface, a second branch pipe connected to a gas box on the second side and connected to the main exhaust pipe through the bottom surface, and a detector on the second branch pipe configured to detect presence of the hazardous gas and downstream to the gas box. The first and the second branch pipes are connected to the main exhaust pipe at a first location and a second location, respectively. The first location is more upstream than the second location.