Jump to content

18663238. INTEGRATED CIRCUIT SEMICONDUCTOR DEVICE (SAMSUNG ELECTRONICS CO., LTD.)

From WikiPatents

INTEGRATED CIRCUIT SEMICONDUCTOR DEVICE

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Cheolsoon Jeong of Suwon-si KR

Sangjung Kang of Suwon-si KR

Jido Ryu of Suwon-si KR

Hwasung Rhee of Suwon-si KR

Hochul Lim of Suwon-si KR

INTEGRATED CIRCUIT SEMICONDUCTOR DEVICE

This abstract first appeared for US patent application 18663238 titled 'INTEGRATED CIRCUIT SEMICONDUCTOR DEVICE

Original Abstract Submitted

An integrated circuit semiconductor device includes an active fin on a substrate, gate structures apart from one another on the active fin, an interlayer insulation layer to insulate the gate structures on the active fin, gate contacts apart from one another on the gate structures, active contacts apart from one another at both sides of the gate structures, the active contacts passing through the interlayer insulation layer and contacting the active fin, an etch stopping layer on the gate structures, the interlayer insulation layer, the gate contacts, and the active contacts, and diffusion break regions between the active contacts, the diffusion break regions being buried in gate trenches passing through the etch stopping layer and the interlayer insulation layer and in fin recesses cutting the active fin under the gate trenches.

Cookies help us deliver our services. By using our services, you agree to our use of cookies.