18640999. GRID FOR SEMICONDUCTOR PROCESS (Samsung Electronics Co., Ltd.)
GRID FOR SEMICONDUCTOR PROCESS
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GRID FOR SEMICONDUCTOR PROCESS
This abstract first appeared for US patent application 18640999 titled 'GRID FOR SEMICONDUCTOR PROCESS
Original Abstract Submitted
A substrate processing apparatus comprises a process chamber, a stage in the process chamber, the stage supporting a substrate, and a grid in the process chamber and upwardly spaced apart from the stage. The grid includes a dielectric plate having a central axis that extends in a first direction, a first electrode plate embedded in the dielectric plate, a second electrode plate downwardly spaced apart from the first electrode plate and embedded in the dielectric plate, and a third electrode plate downwardly spaced apart from the second electrode plate and embedded in the dielectric plate.