18628269. UPPER ELECTRODE STRUCTURE AND PLASMA PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)

UPPER ELECTRODE STRUCTURE AND PLASMA PROCESSING APPARATUS

Organization Name

Tokyo Electron Limited

Inventor(s)

Tetsuji Sato of Miyagi (JP)

UPPER ELECTRODE STRUCTURE AND PLASMA PROCESSING APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18628269 titled 'UPPER ELECTRODE STRUCTURE AND PLASMA PROCESSING APPARATUS

Simplified Explanation: The patent application describes a plasma processing apparatus with a plasma processing chamber, a substrate support with a lower electrode, and an upper electrode structure.

Key Features and Innovation:

• Plasma processing chamber with substrate support and electrodes.
• Upper electrode structure positioned above the substrate support.

Potential Applications: This technology can be used in semiconductor manufacturing, thin film deposition, and surface modification processes.

Problems Solved: The technology addresses the need for precise and controlled plasma processing in various industrial applications.

Benefits:

• Enhanced control over plasma processing.
• Improved quality and consistency of processed materials.
• Increased efficiency in manufacturing processes.

Commercial Applications: Commercial applications include semiconductor fabrication, solar cell production, and advanced material research.

Prior Art: Readers can explore prior art related to plasma processing, semiconductor manufacturing, and thin film deposition to understand the background of this technology.

Frequently Updated Research: Stay updated on research related to plasma processing techniques, semiconductor industry advancements, and material science innovations.

Questions about Plasma Processing Technology: 1. What are the key components of a plasma processing apparatus?

  - The key components include a plasma processing chamber, a substrate support with a lower electrode, and an upper electrode structure.

2. How does plasma processing technology benefit industrial applications?

  - Plasma processing technology offers enhanced control, improved quality, and increased efficiency in various industrial processes.

Original Abstract Submitted

A plasma processing apparatus comprises a plasma processing chamber, a substrate support disposed in the plasma processing chamber and including a lower electrode, an upper electrode structure disposed above the substrate support.