ON-THE-FLY MEASUREMENT OF SUBSTRATE STRUCTURES

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Inventor(s)

ON-THE-FLY MEASUREMENT OF SUBSTRATE STRUCTURES - A simplified explanation of the abstract

This abstract first appeared for US patent application 18611531 titled 'ON-THE-FLY MEASUREMENT OF SUBSTRATE STRUCTURES

Simplified Explanation:

The method described in the patent application involves determining multiple measurement targets on a substrate with various structures. The method includes moving the substrate to position each target within the view of a measurement instrument for analysis.

The method determines measurement targets on a substrate with different structures.
It involves moving the substrate to align each target with the measurement instrument.
The targets are analyzed as they pass through the field of view of the instrument.

Key Features and Innovation:

Precise determination of measurement targets on a substrate.
Automated movement of the substrate to position targets for analysis.
Efficient analysis of multiple targets using a measurement instrument.

Potential Applications:

This technology could be applied in industries such as semiconductor manufacturing, quality control, and materials science for precise measurements and analysis of structures on substrates.

Problems Solved:

This technology addresses the challenge of efficiently analyzing multiple measurement targets on substrates with various structures. It streamlines the process of positioning targets for analysis using a measurement instrument.

Benefits:

Improved accuracy in analyzing structures on substrates.
Increased efficiency in conducting measurements.
Automation of the target positioning process for analysis.

Commercial Applications:

Title: Automated Substrate Analysis System for Precision Measurements

This technology could be commercially used in semiconductor manufacturing facilities, research laboratories, and quality control departments for automated and accurate analysis of structures on substrates.

Prior Art:

Readers interested in prior art related to this technology can explore patents and research papers in the fields of automated measurement systems, substrate analysis, and precision instrumentation.

Frequently Updated Research:

Researchers in the field of automated measurement systems and substrate analysis are continually exploring advancements in precision instrumentation and target positioning techniques for efficient analysis of structures on substrates.

Questions about Substrate Analysis Technology:

1. What are the potential limitations of automating the analysis of structures on substrates?

  - Automation may face challenges in accurately positioning targets with complex structures for analysis.

2. How does this technology compare to traditional manual methods of substrate analysis?

  - This technology offers increased efficiency and accuracy compared to manual methods by automating the target positioning process for analysis.

Original Abstract Submitted

A method includes determining a plurality of measurement targets of a substrate. The substrate includes a plurality of structures. Each measurement target is associated with a structure of the plurality of structures. The method further includes operating one or more motors to cause motion of a substrate support to dispose a first measurement target within a field of view of a measurement instrument. The method further includes causing the measurement instrument to take a first measurement of the first measurement target as the first measurement target passes through the field of view of the measurement instrument. The method further includes operating the one or more motors of the substrate support to dispose a second measurement target of the substrate within the field of view of the measurement instrument.