18610723. FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS
Organization Name
Inventor(s)
Michishige Saito of Kurokawa-gun (JP)
Kazuya Nagaseki of Kurokawa-gun (JP)
Shota Kaneko of Kurokawa-gun (JP)
FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18610723 titled 'FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS
The abstract describes a method for forming a component for use in a plasma processing apparatus by irradiating a source material of a first ceramic and a source material of a second ceramic with an energy beam.
- The method involves supplying a source material of a first ceramic and a source material of a second ceramic different from the first ceramic.
- An energy beam is then directed towards the source materials of both ceramics to form the component.
- This process likely results in a component with unique properties due to the combination of two different ceramics.
- The method may offer improved performance and durability in plasma processing applications.
- By combining different ceramics, the component may exhibit enhanced resistance to high temperatures and chemical reactions.
Potential Applications: - This method could be used to create components for various plasma processing applications, such as semiconductor manufacturing or surface treatment processes.
Problems Solved: - The method addresses the need for components with improved performance and durability in harsh plasma processing environments.
Benefits: - Enhanced resistance to high temperatures and chemical reactions. - Improved performance and durability in plasma processing applications.
Commercial Applications: - This technology could be valuable in industries that rely on plasma processing, such as semiconductor manufacturing, aerospace, and medical device manufacturing.
Questions about the Technology: 1. How does the combination of two different ceramics in the component enhance its performance? 2. What specific properties of the component make it suitable for use in plasma processing applications?
Original Abstract Submitted
A forming method of a component for use in a plasma processing apparatus includes irradiating, while supplying a source material of a first ceramic and a source material of a second ceramic different from the first ceramic, an energy beam to the source material of the first ceramic and the source material of the second ceramic.
