PARTICLE BEAM MICROSCOPE

Organization Name

Inventor(s)

PARTICLE BEAM MICROSCOPE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18600313 titled 'PARTICLE BEAM MICROSCOPE

The abstract describes a particle beam microscope with specific components and a potential supply system that provides different potentials to various parts of the microscope.

Electron beam source
Magnetic objective lens with two pole ends
Object holder
Scintillator
Ring electrode
Potential supply system

- Key Features and Innovation:**

Different potentials provided to object holder, ring electrode, scintillator, and beam tube
Specific potential relationships (U4>U1, U3>U1, U2>U1, U2>U3)
Utilization of electron beam source and magnetic objective lens for imaging

- Potential Applications:**

Material analysis
Biological sample imaging
Semiconductor inspection

- Problems Solved:**

Enhanced imaging resolution
Improved sample analysis accuracy
Efficient particle beam manipulation

- Benefits:**

High-quality imaging
Precise sample analysis
Versatile applications in various fields

- Commercial Applications:**

Particle beam microscopes can be used in industries such as semiconductor manufacturing, materials science, and biological research for high-resolution imaging and analysis.

- Questions about Particle Beam Microscopes:**

1. How does the potential supply system impact the imaging capabilities of the microscope?

  - The potential supply system plays a crucial role in controlling the electron beam and optimizing imaging resolution by providing different potentials to key components.

2. What are the main advantages of using a particle beam microscope over other imaging techniques?

  - Particle beam microscopes offer high resolution and the ability to analyze samples at the nanoscale, making them ideal for various scientific and industrial applications.

Original Abstract Submitted

A particle beam microscope comprises an electron beam source, a beam tube, a magnetic objective lens having two pole ends, an object holder, a scintillator between the lower end of the beam tube and an object, a ring electrode between the scintillator and the object, and a potential supply system. The potential supply system provides: a potential U1 to the object holder; a potential U2 to the ring electrode; a potential U3 to the scintillator; and a potential to an electrically conductive inner lateral surface of the beam tube, such that U4>U1, U3>U1, U2>U1 and U2>U3.