OPTIMIZED LIGHT EMITTING DEVICE

Organization Name

CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE

Inventor(s)

François Balembois of BOISSY LE SEC (FR)

OPTIMIZED LIGHT EMITTING DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18570898 titled 'OPTIMIZED LIGHT EMITTING DEVICE

The abstract describes a light emitting device that utilizes a solid fluorescent or scintillator material to absorb incident light and emit luminescent light, with a portion of the light being trapped by total internal reflections within the material.

The device includes a material with two large faces and multiple side faces forming vertices between them.
The material has rotational symmetry around a z-axis perpendicular to the horizontal plane, ensuring invariance of normals to the side faces.
The material may have a beveled vertex or an edge between two side faces, enhancing light trapping efficiency.

Potential Applications: - Medical imaging - Radiation detection - Security systems

Problems Solved: - Enhanced light emission efficiency - Improved signal-to-noise ratio in imaging applications

Benefits: - Increased sensitivity in detecting low levels of radiation - Higher resolution in imaging applications

Commercial Applications: Title: Advanced Light Emitting Devices for Medical Imaging and Security Systems This technology can be used in medical imaging devices, security systems, and radiation detectors, offering improved performance and efficiency in various applications.

Questions about the technology: 1. How does the rotational symmetry of the material contribute to light trapping efficiency? 2. What are the specific advantages of using a beveled vertex in the material design?

Original Abstract Submitted

A light emitting device including a solid fluorescent material or a solid scintillator material adapted to absorb an incident light and then emit a luminescent light in the material, a portion, called trapped portion, of the luminescent light being trapped by total internal reflections in the material, the material including two parallel faces, called large faces, along an horizontal plane xy, and n∈N>2 faces called side faces, and forming vertex between two adjacent side faces and a large face. The material has an invariance of the normals to said side faces by rotation by an angle of 2π/n in said horizontal plan around a z-axis perpendicular to the horizontal plane. The material has a vertex called virtual vertex that is beveled thus forming a surface called beveled vertex, or the material has an edge between two side faces.