FILM THICKNESS MEASUREMENT DEVICE

Organization Name

INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor(s)

Shih-Hsiang Lai of New Taipei City TW

Fu-Cheng Yang of Hsinchu County TW

Fu-Ching Tung of Hsinchu City TW

Hsuan-Fu Wang of Hsinchu City TW

Po-Chun Yeh of Taichung City TW

FILM THICKNESS MEASUREMENT DEVICE

This abstract first appeared for US patent application 18539069 titled 'FILM THICKNESS MEASUREMENT DEVICE

Original Abstract Submitted

A film thickness measurement device includes a spectroscopic ellipsometer, and the spectroscopic ellipsometer includes a projection module and a light receiving module. The projection module is configured to project a multi-wavelength polarized light onto a thin film. The projection module includes a light source and a polarization state generator. The light receiving module includes a polarization analyzer and an optical detector. The polarization analyzer is configured to screen out a multi-wavelength polarized reflection light according to reflection of the multi-wavelength polarized light by the thin film. The optical detector is configured to receive the multi-wavelength polarized reflection light. The optical detector includes at least one optical splitting unit, at least two optical filtering units and at least two optical detection units.