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18538100. CHAMBER AND METHODS FOR DOWNSTREAM RESIDUE MANAGEMENT (Applied Materials, Inc.)

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CHAMBER AND METHODS FOR DOWNSTREAM RESIDUE MANAGEMENT

Organization Name

Applied Materials, Inc.

Inventor(s)

Zaoyuan Ge of San Jose CA US

Manjunath Veerappa Chobari Patil of Karnataka IN

Pavan Kumar S M of Karnataka IN

Dinesh Babu of Tamilnadu IN

Nuo Wang of Santa Clara CA US

Kaili Yu of Sunnyvale CA US

Xinyi Zhong of Santa Clara CA US

Bharati Neelamraju of Sunnyvale CA US

Liangfa Hu of Newark CA US

Neela Ayalasomayajula of Bengaluru IN

Sungwon Ha of Palo Alto CA US

Prashant Kumar Kulshreshtha of San Jose CA US

Amit Bansal of Milpitas CA US

Daemian Raj Benjamin Raj of Fremont CA US

Badri N. Ramamurthi of Los Gatos CA US

Travis Mazzy of Fremont CA US

Mohammed Salman Mohiuddin of Santa Clara CA US

Karthik Suresh Menon of Sunnyvale CA US

Lihua Wu of Fremont CA US

Prasath Poomani of Tamilnadu IN

CHAMBER AND METHODS FOR DOWNSTREAM RESIDUE MANAGEMENT

This abstract first appeared for US patent application 18538100 titled 'CHAMBER AND METHODS FOR DOWNSTREAM RESIDUE MANAGEMENT

Original Abstract Submitted

Semiconductor processing chambers and systems, as well as methods of cleaning such chambers and systems are provided. Processing chambers and systems include a chamber body that defines a processing region, a liner positioned within the chamber body that defines a liner volume, a faceplate positioned atop the liner, a substrate support disposed within the chamber body, and a cleaning gas source coupled with the liner volume through a cleaning gas plenum and one or more inlet apertures. Systems and chambers include where at least one of the one or more inlet apertures is disposed in the processing region between the faceplate and a bottom wall of the chamber body.

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