18532505. LAMINATE AND METHOD OF MANUFACTURING LAMINATE simplified abstract (Japan Display Inc.)
LAMINATE AND METHOD OF MANUFACTURING LAMINATE
Organization Name
Inventor(s)
Satoshi Kamiyama of Nagoya-shi (JP)
Motoaki Iwaya of Nagoya-shi (JP)
Tetsuya Takeuchi of Nagoya-shi (JP)
LAMINATE AND METHOD OF MANUFACTURING LAMINATE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18532505 titled 'LAMINATE AND METHOD OF MANUFACTURING LAMINATE
Simplified Explanation
The patent application describes a laminate consisting of an amorphous glass substrate with an AlN layer oriented on top of it. The glass substrate has specific thermal properties such as a glass transition temperature, coefficient of thermal expansion, and softening point.
- Amorphous glass substrate with AlN layer
- AlN layer c-axis oriented on glass substrate
- Glass transition temperature of 720°C to 810°C
- Coefficient of thermal expansion of 3.5×10^(-1/K) to 4.0×10^(-1/K)
- Softening point of 950°C to 1050°C
Potential Applications
The technology could be used in:
- High-temperature electronics
- Thermal management systems
- Aerospace components
Problems Solved
This technology addresses issues related to:
- High-temperature stability
- Thermal expansion mismatch
- Material compatibility
Benefits
The benefits of this technology include:
- Improved thermal performance
- Enhanced durability
- Increased reliability
Potential Commercial Applications
Potential commercial applications include:
- High-temperature sensors
- Power electronics
- Automotive components
Possible Prior Art
One possible prior art could be the use of AlN layers on substrates for thermal management applications.
Unanswered Questions
1. What specific industries could benefit the most from this technology? 2. Are there any limitations to the thermal properties of the glass substrate that could affect its practical applications?
Original Abstract Submitted
A laminate includes an amorphous glass substrate, and an AlN layer formed on the amorphous glass substrate. The AlN layer is c-axis oriented on the amorphous glass substrate, a glass transition temperature (Tg) of the amorphous glass substrate is 720° C. to 810° C., a coefficient of thermal expansion (CTE) of the amorphous glass substrate is 3.5×10[1/K] to 4.0×10[1/K], and a softening point of the amorphous glass substrate is 950° C. to 1050° C.
