SUSCEPTOR AND METHOD OF MANUFACTURING THE SAME

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SUSCEPTOR AND METHOD OF MANUFACTURING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18525387 titled 'SUSCEPTOR AND METHOD OF MANUFACTURING THE SAME

The abstract describes a method of manufacturing a susceptor, involving the preparation of an electrostatic chuck (ESC) and a base plate, each with a gas channel, and the assembly of a bush-filter between the gas channels in the ESC and the base plate.

ESC and base plate are prepared with gas channels.
Bush-filter assembly is placed between the gas channels in ESC and base plate.
ESC is coupled to the base plate, accommodating the bush-filter assembly in different parts of their surfaces.

Potential Applications: - Semiconductor manufacturing - Thin film deposition processes

Problems Solved: - Improved thermal management - Enhanced process control

Benefits: - Increased efficiency in heat transfer - Better control over gas flow

Commercial Applications: Title: Advanced Susceptor Manufacturing Technology This technology can be used in industries such as semiconductor manufacturing, electronics, and materials science for improved process control and efficiency.

Questions about Susceptor Manufacturing: 1. How does this technology improve thermal management in semiconductor manufacturing? 2. What are the key benefits of using a bush-filter assembly in the susceptor manufacturing process?

Original Abstract Submitted

A method of manufacturing a susceptor includes preparing an electrostatic chuck (ESC) and a base plate, each including a gas channel, preparing a bush-filter assembly disposed between the gas channel in the ESC and the gas channel in the base plate, and coupling the ESC to the base plate in such a manner that a portion of the bush-filter assembly is accommodated in a first accommodation part formed in a surface of the ESC and that a remaining portion of the bush-filter assembly is at least partially accommodated in a second accommodation part formed in a surface of the base plate.