18491550. SEMICONDUCTOR DEVICE HAVING A SEPARATION STRUCTURE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
SEMICONDUCTOR DEVICE HAVING A SEPARATION STRUCTURE
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SEMICONDUCTOR DEVICE HAVING A SEPARATION STRUCTURE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18491550 titled 'SEMICONDUCTOR DEVICE HAVING A SEPARATION STRUCTURE
Simplified Explanation
The semiconductor device described in the patent application includes various patterns and structures to enhance its performance and functionality.
Key Features and Innovation
- Substrate with lower pattern, channel pattern, and source/drain pattern
- First and second gate structures intersecting in different directions
- Separation structure between gate structures with protruding portion towards channel pattern
- Stacked conductive patterns in the first gate structure
Potential Applications
This technology can be applied in the manufacturing of advanced semiconductor devices for various electronic applications such as mobile devices, computers, and automotive systems.
Problems Solved
The technology addresses the need for improved performance and efficiency in semiconductor devices by optimizing the layout and design of key components.
Benefits
- Enhanced performance and functionality of semiconductor devices
- Increased efficiency and reliability
- Potential for smaller and more powerful electronic devices
Commercial Applications
- Advanced semiconductor manufacturing industry
- Electronics and technology companies
- Research and development organizations in the semiconductor field
Prior Art
Readers can explore prior patents and research related to semiconductor device structures, gate structures, and channel patterns to understand the evolution of this technology.
Frequently Updated Research
Researchers are constantly exploring new materials and designs to further enhance the performance of semiconductor devices, including gate structures and channel patterns.
Questions about Semiconductor Device Structures
What are the key components of a semiconductor device structure?
A semiconductor device structure typically includes a substrate, various patterns such as channel and source/drain patterns, gate structures, and separation structures.
How do gate structures impact the performance of a semiconductor device?
Gate structures play a crucial role in controlling the flow of electrical current in the channel pattern of a semiconductor device, affecting its overall functionality and efficiency.
Original Abstract Submitted
A semiconductor device may include: a substrate; a lower pattern extending from the substrate in a first direction; a channel pattern disposed on the lower pattern; a source/drain pattern disposed on sides of the channel pattern; a first gate structure and a second gate structure extending in a second direction intersecting the first direction and surrounding respective portions of the channel pattern; and a separation structure disposed between the first gate structure and the second gate structure, and including a first portion extending in the first direction and a second portion protruding from the first portion toward the channel pattern, wherein the first gate structure includes first and second conductive patterns stacked sequentially from the respective portion of the channel pattern, and a length of the second conductive pattern in the second direction is equal to or greater than a length of the second portion in the second direction.
