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18487630. MONITOR STRUCTURES FOR MEASURING DEVICE IMPEDANCE (TEXAS INSTRUMENTS INCORPORATED)

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MONITOR STRUCTURES FOR MEASURING DEVICE IMPEDANCE

Organization Name

TEXAS INSTRUMENTS INCORPORATED

Inventor(s)

Gang Xue of SAN JOSE CA US

Steven Burich of ALLEN TX US

MONITOR STRUCTURES FOR MEASURING DEVICE IMPEDANCE

This abstract first appeared for US patent application 18487630 titled 'MONITOR STRUCTURES FOR MEASURING DEVICE IMPEDANCE

Original Abstract Submitted

In a described example, a semiconductor wafer can include a first monitor structure in a scribe line adjacent to a die, the first monitor structure including a first source region, a first drain region, and a first gate region. The first gate region can include a first elongated finger extending longitudinally between the first source region and the first drain region, as viewed from a top plan view. The semiconductor wafer can include a second monitor structure in the scribe line, the second monitor structure including one or more second source regions, one or more second drain regions, and a plurality of second gate regions. The second gate regions can include a second elongated finger extending longitudinally over a respective region of the die between the one or more second source regions and the one or more second drain regions, as viewed from the top plan view.

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