18441681. IMAGE SENSOR AND METHOD OF FABRICATING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
IMAGE SENSOR AND METHOD OF FABRICATING THE SAME
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IMAGE SENSOR AND METHOD OF FABRICATING THE SAME
This abstract first appeared for US patent application 18441681 titled 'IMAGE SENSOR AND METHOD OF FABRICATING THE SAME
Original Abstract Submitted
An image sensor includes a substrate that includes a first surface and a second surface that are opposite to each other, where the substrate includes a plurality of pixel areas; an isolation pattern that extends from the first surface and into the substrate, where the isolation pattern is between the plurality of pixel areas; and an antireflection layer on the isolation pattern, where the isolation pattern includes: a first device isolation pattern that contacts the antireflection layer; and a second device isolation pattern that is spaced apart from the antireflection layer, where the first device isolation pattern includes: a first dielectric layer; and a conductive reflection layer on the first dielectric layer, and where a top surface of the conductive reflection layer and a top surface of the first dielectric layer extend from the second surface of the substrate by a same distance.