PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOF

Organization Name

Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor(s)

Hao Chu Liao of Hsinchu County TW

Wei Tse Hsu of Hsinchu County TW

Chen-Yen Kao of Hsinchu City TW

PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOF

This abstract first appeared for US patent application 18421399 titled 'PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOF

Original Abstract Submitted

A semiconductor device includes a substrate having a plurality of chip regions. In some embodiments, the semiconductor device further includes a plurality of scribe lines interposing the plurality of chip regions. In some examples, the semiconductor device further includes a first plurality of alignment mark regions distributed within the plurality of scribe lines. In some embodiments, the semiconductor device further includes a second plurality of alignment mark regions distributed within each of the plurality of chip regions.