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18403930. 3-D DRAM WORDLINE PARTITION AND STAIRCASE CONTACTS (Applied Materials, Inc.)

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3-D DRAM WORDLINE PARTITION AND STAIRCASE CONTACTS

Organization Name

Applied Materials, Inc.

Inventor(s)

Chang Seok Kang of Santa Clara CA US

Sony Varghese of Manchester MA US

Tong Liu of Folsom CA US

Fredrick Fishburn of Belmont CA US

3-D DRAM WORDLINE PARTITION AND STAIRCASE CONTACTS

This abstract first appeared for US patent application 18403930 titled '3-D DRAM WORDLINE PARTITION AND STAIRCASE CONTACTS

Original Abstract Submitted

Memory devices are provided which have stacked DRAM cells, resulting in an increase in DRAM cell bit-density. In a 3D DRAM with stacked unit cell layers of one or more embodiments, it is necessary to reduce the area of a unit cell in order to increase bit density per unit area for a given number of stacked cells. In one or more embodiments, n wordlines (nWL, n is an integer≥2) share a contact pad. The shared nWLs are separated by n bitlines (BLs) to assign every cell independently one WL and one BL.

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