SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THEREOF

Organization Name

Inventor(s)

Seo Woo Nam of Suwon-si, Gyeonggi-do (KR)

Eui Bok Lee of Suwon-si, Gyeonggi-do (KR)

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THEREOF

This abstract first appeared for US patent application 18398370 titled 'SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THEREOF

Original Abstract Submitted

A semiconductor device includes a lower wiring structure, an upper interlayer insulating film on the lower wiring structure and including an upper wiring trench and an upper wiring structure in the upper wiring trench. The upper wiring structure includes an upper barrier structure, and an upper filling film on the upper barrier structure. The upper barrier structure includes side wall portions extending along side walls of the upper wiring trench, and a bottom portion extending along a bottom face of the upper wiring trench. The upper barrier structure includes an upper barrier film, and an upper liner film between the upper barrier film and the upper filling film. The side wall portions of the upper barrier structure include a two-dimensional material (2D material), and the bottom face of the upper barrier structure is free of the two-dimensional material.