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18395487. AIRFLOW CONTROL SYSTEM AND AIRFLOW CONTROL METHOD simplified abstract (SEMES CO., LTD.)

From WikiPatents

AIRFLOW CONTROL SYSTEM AND AIRFLOW CONTROL METHOD

Organization Name

SEMES CO., LTD.

Inventor(s)

Ickkyun Kim of Cheonan-si (KR)

Sang Yong Eom of Cheonan-si (KR)

Cheol Park of Cheonan-si (KR)

Moon Hyung Bae of Cheonan-si (KR)

Tae Young Kim of Cheonan-si (KR)

AIRFLOW CONTROL SYSTEM AND AIRFLOW CONTROL METHOD - A simplified explanation of the abstract

This abstract first appeared for US patent application 18395487 titled 'AIRFLOW CONTROL SYSTEM AND AIRFLOW CONTROL METHOD

Simplified Explanation

The patent application describes an airflow control system for clean rooms in semiconductor manufacturing facilities to prevent the inflow of foreign particles. The system includes grating panels with through holes, semiconductor manufacturing equipment, a fan, and a negative pressure preventer.

  • The system includes grating panels with through holes mounted on the floor of a clean room.
  • Semiconductor manufacturing equipment is spaced apart from the grating panel by a gap space using supports or legs.
  • A fan is mounted towards the grating panel to create an inner downward airflow.
  • A negative pressure preventer is used to prevent the formation of negative pressure in the gap space.

Key Features and Innovation

  • Grating panels with through holes to control airflow.
  • Semiconductor manufacturing equipment spaced apart from the grating panel.
  • Fan for creating inner downward airflow.
  • Negative pressure preventer to avoid local negative pressure formation.

Potential Applications

The technology can be applied in clean rooms of semiconductor manufacturing facilities to maintain air quality and prevent the inflow of foreign particles.

Problems Solved

The system addresses the issue of foreign particle contamination in clean rooms, which can affect the quality of semiconductor manufacturing processes.

Benefits

  • Improved air quality in clean rooms.
  • Prevention of foreign particle contamination.
  • Enhanced efficiency of semiconductor manufacturing processes.

Commercial Applications

Title: Airflow Control System for Semiconductor Manufacturing Clean Rooms The technology can be commercially used in semiconductor manufacturing facilities to ensure the cleanliness of the environment and optimize manufacturing processes.

Prior Art

Readers can explore prior research on airflow control systems in clean rooms and semiconductor manufacturing facilities to understand the evolution of similar technologies.

Frequently Updated Research

Researchers are continually studying airflow control systems in clean rooms to enhance semiconductor manufacturing processes and maintain high air quality standards.

Questions about Airflow Control Systems

How does the negative pressure preventer work in the system?

The negative pressure preventer in the system is designed to counteract the formation of local negative pressure in the gap space by equalizing the pressure difference between the inner and outer airflow.

What are the key components of the airflow control system described in the patent application?

The key components of the system include grating panels with through holes, semiconductor manufacturing equipment, a fan for creating inner downward airflow, and a negative pressure preventer to maintain pressure balance.


Original Abstract Submitted

Provided is an airflow control system and airflow control method capable of preventing the inflow of foreign, the airflow control system including at least one grating panel mounted on a floor of a clean room and including a plurality of through holes, a semiconductor manufacturing equipment spaced apart from the grating panel by a gap space by using supports or legs, and including a fan mounted toward the grating panel, and a negative pressure preventer for preventing a negative pressure locally formed in the gap space due to a pressure difference between an outer downward airflow flowing along sides of the semiconductor manufacturing equipment and expelled to an outside through the through holes of the grating panel, and an inner downward airflow flowing from the semiconductor manufacturing equipment to the grating panel by the fan and expelled to the outside through the through holes of the grating panel.

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