18384810. DIO3 SPRAY TANK FOR POST CMP SUBSTRATE CLEANING (Applied Materials, Inc.)
DIO3 SPRAY TANK FOR POST CMP SUBSTRATE CLEANING
Organization Name
Inventor(s)
Clinton P. Sakata of Santa Clara CA US
DIO3 SPRAY TANK FOR POST CMP SUBSTRATE CLEANING
This abstract first appeared for US patent application 18384810 titled 'DIO3 SPRAY TANK FOR POST CMP SUBSTRATE CLEANING
Original Abstract Submitted
Embodiments of the disclosure provided herein include an apparatus and method for processing a substrate which may be used to clean the surface of a substrate. The apparatus includes a cleaning module. The cleaning module includes a tank, a processing fluid delivery system configured to deliver a processing fluid includes ozone to the tank, a drain disposed at a bottom of the tank, and an exhaust system disposed at a top of the tank. The processing fluid delivery system includes a front side spray bar port coupled to a front side spray bar located within the tank, and a back side spray bar port coupled to a back side spray bar located within the tank opposite the front side spray bar.