18379915. SHOWERHEAD DESIGN FOR PLASMA-ENHANCED DEPOSITION (Applied Materials, Inc.)
SHOWERHEAD DESIGN FOR PLASMA-ENHANCED DEPOSITION
Organization Name
Inventor(s)
Youngki Chang of Santa Clara CA US
Sanket S. Kurbet of Bangalore IN
Dhritiman Subha Kashyap of Bangalore IN
Tejas Umesh Ulav of Fremont CA US
SHOWERHEAD DESIGN FOR PLASMA-ENHANCED DEPOSITION
This abstract first appeared for US patent application 18379915 titled 'SHOWERHEAD DESIGN FOR PLASMA-ENHANCED DEPOSITION
Original Abstract Submitted
Showerhead assemblies for semiconductor manufacturing processing chambers and semiconductor manufacturing processing chambers using the showerhead assemblies are described. The showerhead assemblies comprise a backing plate with an embedded heater and a faceplate. The embedded heater has a radius sufficient to located the heater over a sidewall of the processing chamber and reduces temperature non-uniformity of a wafer during processing.