18236711. IN-SITU ION BEAM ANGLE MEASUREMENT (Applied Materials, Inc.)
IN-SITU ION BEAM ANGLE MEASUREMENT
Organization Name
Inventor(s)
Daniel Distaso of Rowley MA (US)
Thomas Soldi of Somerville MA (US)
Joseph C. Olson of Beverly MA (US)
IN-SITU ION BEAM ANGLE MEASUREMENT
This abstract first appeared for US patent application 18236711 titled 'IN-SITU ION BEAM ANGLE MEASUREMENT
Original Abstract Submitted
A processing system that includes an ion source to direct an ion beam at a workpiece, and an angle measurement system, is disclosed. The angle measurement system includes a current measurement device, such as one or more Faraday sensors, that may be moved in at least two orthogonal directions. The current measurement device scans in a first direction, seeking the largest current measurement. The current measurement device then moves to a second position in the second direction and repeats the scanning procedure. Based on data collected at two different locations in the second direction, the angle of incidence of the incoming ion beam may be determined.