Ceramic Pedestal Shaft with Heated/Cooled Gas Tube

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Ceramic Pedestal Shaft with Heated/Cooled Gas Tube - A simplified explanation of the abstract

This abstract first appeared for US patent application 18179503 titled 'Ceramic Pedestal Shaft with Heated/Cooled Gas Tube

The semiconductor processing apparatus described in the abstract consists of a wafer pedestal with embedded ceramic gas delivery tubes, made of a first ceramic material, within a ceramic pedestal shaft, made of a second ceramic material, coupled to a ceramic wafer chuck.

The wafer pedestal includes a ceramic pedestal shaft with a central through opening and ceramic gas delivery tubes embedded within it.
The ceramic gas delivery tubes are made of a first ceramic material, while the ceramic pedestal shaft is made of a second ceramic material.
The ceramic gas delivery tubes are coupled to gas channels in the ceramic wafer chuck.

Potential Applications: - Semiconductor manufacturing processes - Thin film deposition - Plasma etching

Problems Solved: - Improved gas delivery in semiconductor processing - Enhanced wafer processing efficiency - Reduced contamination risks

Benefits: - Higher precision in gas delivery - Increased process reliability - Extended equipment lifespan

Commercial Applications: Title: Advanced Semiconductor Processing Apparatus for Enhanced Efficiency This technology can be utilized in semiconductor fabrication facilities to improve processing accuracy and efficiency, leading to higher quality semiconductor products and increased productivity in the industry.

Questions about the technology: 1. How does the use of ceramic materials in the gas delivery tubes and pedestal shaft improve the semiconductor processing apparatus?

  - The use of ceramic materials enhances durability, resistance to high temperatures, and reduces contamination risks in the processing environment.

2. What are the specific advantages of embedding gas delivery tubes within the pedestal shaft in semiconductor processing?

  - Embedding the gas delivery tubes within the pedestal shaft allows for more precise gas delivery directly to the wafer, improving process control and efficiency.

Original Abstract Submitted

A semiconductor processing apparatus that includes: a wafer pedestal including a ceramic pedestal shaft coupled to an underside of a ceramic wafer chuck, the ceramic pedestal shaft having a central through opening; and ceramic gas delivery tubes embedded within the ceramic pedestal shaft, the ceramic gas delivery tubes being made of a first ceramic material and the ceramic pedestal shaft being made of a second ceramic material, the ceramic gas delivery tubes being coupled to gas channels in the ceramic wafer chuck.