18172488. DEFECT DETECTION SYSTEM FOR CAVITY IN INTEGRATED CIRCUIT simplified abstract (GlobalFoundries U.S. Inc.)
DEFECT DETECTION SYSTEM FOR CAVITY IN INTEGRATED CIRCUIT
Organization Name
Inventor(s)
Zhuojie Wu of Port Chester NY (US)
Yunyao Jiang of Mechanicville NY (US)
DEFECT DETECTION SYSTEM FOR CAVITY IN INTEGRATED CIRCUIT - A simplified explanation of the abstract
This abstract first appeared for US patent application 18172488 titled 'DEFECT DETECTION SYSTEM FOR CAVITY IN INTEGRATED CIRCUIT
Simplified Explanation
The patent application describes a structure that acts as a defect sensor for a cavity in an integrated circuit. The structure includes a cavity in a substrate, with a metal line arranged in a serpentine path crossing the boundary of the cavity.
- The structure provides a defect sensor for a cavity in an integrated circuit.
- A metal line is arranged in a serpentine path to detect defects.
- A controller can generate an indication of a defect based on changes in electrical characteristics.
- The structure may be used in a photonics integrated circuit with an optical waveguide.
Potential Applications
The technology can be applied in various fields such as semiconductor manufacturing, integrated circuit design, and photonics.
Problems Solved
The structure helps in detecting defects in integrated circuits, improving overall quality and reliability.
Benefits
- Enhanced defect detection capabilities - Improved reliability of integrated circuits - Potential for increased performance in photonics applications
Commercial Applications
Title: "Advanced Defect Sensor for Integrated Circuits" This technology can be utilized in the semiconductor industry for quality control in manufacturing processes. It can also be integrated into photonics applications to enhance performance and reliability.
Prior Art
Readers can explore prior research in the fields of defect detection in integrated circuits and photonics technology to understand the evolution of similar technologies.
Frequently Updated Research
Researchers are constantly working on improving defect detection techniques in integrated circuits and exploring new applications for photonics technology.
Questions about the Technology
What are the key features of the defect sensor structure described in the patent application?
The key features include the arrangement of a metal line in a serpentine path to detect defects in the cavity of an integrated circuit.
How does the controller in the structure help in detecting defects in the integrated circuit?
The controller responds to changes in electrical characteristics of the signal through the metal line to generate an indication of the presence of a defect.
Original Abstract Submitted
A structure provides a defect sensor for a cavity in an integrated circuit (IC). The structure includes a cavity defined in a substrate. A boundary is located where the cavity meets with a cavity-free area of the substrate. A metal line is arranged in a serpentine path in both a vertical and a horizontal direction and crosses the boundary. A controller may be provided that is configured to, in response to a change in an electrical characteristic of a signal through the metal line, generate an indication of the presence of a defect and/or change operation of at least one component of the IC. The structure may find application relative to a photonics integrated circuit (PIC) structure including an optical waveguide with a cavity under the optical waveguide.
