LOUVER DESIGN FOR ELIMINATING LINE OF SIGHT

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LOUVER DESIGN FOR ELIMINATING LINE OF SIGHT - A simplified explanation of the abstract

This abstract first appeared for US patent application 18172149 titled 'LOUVER DESIGN FOR ELIMINATING LINE OF SIGHT

The patent application describes an apparatus and system designed to minimize particle return to the processing area of a processing chamber, specifically for a semiconductor vacuum processing chamber.

The particle shield includes an annular ring, rib supports, and louver fins.
The annular ring has cutaways and supports rib supports on its lower inner portion.
The louver fins have a truncated conical shape and are supported by the rib supports.
Each louver fin is positioned between adjacent concentric louver fins with varying diameters.

Potential Applications: - Semiconductor manufacturing processes - Vacuum processing chambers in various industries

Problems Solved: - Minimizing particle return to the processing area - Improving the efficiency of semiconductor vacuum processing chambers

Benefits: - Enhanced cleanliness and precision in processing chambers - Reduced contamination and maintenance costs

Commercial Applications: - Semiconductor fabrication facilities - Research and development laboratories - High-tech manufacturing industries

Questions about the technology: 1. How does the particle shield improve the performance of semiconductor vacuum processing chambers? 2. What specific industries can benefit the most from this technology?

Frequently Updated Research: - Stay updated on advancements in semiconductor processing technology and cleanroom design for potential improvements in particle control systems.

Original Abstract Submitted

An apparatus and system for minimizing particle return to the processing area of a processing chamber are disclosed herein. In one example, a particle shield for a semiconductor vacuum processing chamber includes an annular ring, a plurality of rib supports, and a plurality of louver fins. The annular ring has top surface, a bottom surface, and a plurality of cutaways. The top surface has an upper outer portion and a lower inner portion. The plurality of rib supports are disposed on and supported by the lower inner portion. The plurality of louver fins have a truncated conical shape, a bottom surface of the louver fins supported in a recess formed in a top surface of the rib supports. Each of the plurality of louver fins are disposed between adjacent concentric louver fins that have an outer diameter greater than an inner diameter of the outwardly adjacent louver fin.