18110668. PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY simplified abstract (Applied Materials, Inc.)
PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY
Organization Name
Inventor(s)
Sathiyamurthi Govindasamy of Coimbatore (IN)
Harish V. Penmethsa of Dublin CA (US)
Suresh Palanisamy of Coimbatore (IN)
Naresh Kumar Asokan of Coimbatore (IN)
Karunakaran Nataraj of Coimbatore (IN)
PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY - A simplified explanation of the abstract
This abstract first appeared for US patent application 18110668 titled 'PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY
Simplified Explanation: The patent application describes apparatus and methods for improving film uniformity in a physical vapor deposition (PVD) process by using a magnetron translation assembly with linear actuator assemblies and magnet assemblies.
- The magnetron translation assembly includes a first linear actuator assembly with a first rail and a first actuator to position a magnet assembly along the rail.
- The magnet assembly is constructed to rotate about an axis perpendicular to the rail for improved film deposition.
- A second linear actuator assembly with a second rail is coupled to the first assembly for precise positioning on a mounting surface.
Key Features and Innovation:
- Use of a magnetron translation assembly for improved film uniformity in PVD processes.
- Integration of linear actuator assemblies and magnet assemblies for precise positioning.
- Rotation capability of the magnet assembly for enhanced film deposition control.
Potential Applications: The technology can be applied in industries such as semiconductor manufacturing, optical coatings, and solar panel production for improved film quality and uniformity.
Problems Solved: The technology addresses issues related to film uniformity and quality control in PVD processes, leading to enhanced product performance and consistency.
Benefits:
- Improved film uniformity and quality in PVD processes.
- Enhanced control over film deposition for better product performance.
- Increased efficiency and consistency in manufacturing processes.
Commercial Applications: The technology can be utilized in industries such as electronics, optics, and renewable energy for producing high-quality films with improved uniformity, leading to better product performance and customer satisfaction.
Questions about Film Uniformity Improvement: 1. How does the magnetron translation assembly contribute to improving film uniformity in PVD processes? 2. What are the potential benefits of using linear actuator assemblies and magnet assemblies in film deposition control?
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Original Abstract Submitted
Apparatus and methods for improving film uniformity in a physical vapor deposition (PVD) process are provided herein. In some embodiments, a magnetron translation assembly comprises a first linear actuator assembly with a first rail which is aligned in a first direction and a first actuator that is configured to position a first mount along the first rail; a magnet assembly is mounted on the first mount, the magnet assembly constructed and arranged to be rotated about an axis perpendicular to the first rail; and a second linear actuator assembly comprising a second mount that is configured to be positioned along a second rail, which is aligned in a second direction and the first linear actuator assembly is coupled to a mounting surface of the second mount.
