MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS

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MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18108327 titled 'MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS

Simplified Explanation: The patent application describes molybdenum precursors and methods for forming molybdenum-containing films on a substrate surface. These precursors have high purity levels of molybdenum and are used to create films with high molybdenum content on the substrate.

Key Features and Innovation:

Molybdenum precursors with over 90% molybdenum purity on a molar basis
Formation of molybdenum-containing films with over 80% molybdenum content on an atomic basis
Sequential or simultaneous exposure of substrate to molybdenum precursors and reactants

Potential Applications: The technology can be used in the semiconductor industry for thin film deposition, solar cell manufacturing, and other electronic applications requiring high-purity molybdenum films.

Problems Solved: This technology addresses the need for high-purity molybdenum films in various industrial applications where precise molybdenum content is crucial for performance.

Benefits:

Improved quality and performance of molybdenum-containing films
Enhanced efficiency in thin film deposition processes
Increased reliability in electronic devices utilizing molybdenum films

Commercial Applications: Potential commercial applications include semiconductor manufacturing, solar panel production, and electronic component fabrication where high-purity molybdenum films are essential for performance and reliability.

Questions about Molybdenum Precursors: 1. What are the specific advantages of using molybdenum precursors with high purity levels in film formation? 2. How does the molybdenum content in the films impact the performance of electronic devices?

Frequently Updated Research: Ongoing research in the field of thin film deposition techniques and materials science may provide further insights into optimizing the use of molybdenum precursors for various industrial applications.

Original Abstract Submitted

Molybdenum(0) precursors and methods of forming molybdenum-containing films on a substrate surface are described. The molybdenum(0) precursors have a purity of greater than or equal to 90% molybdenum (Mo) on a molar basis. The substrate is exposed to a molybdenum(0) precursor and a reactant to form a molybdenum-containing film having greater than or equal to 80% molybdenum (Mo) on an atomic basis. In some embodiments, the molybdenum-containing film has greater than or equal to 80% molybdenum (Mo) on a molar basis. The exposures can be sequential or simultaneous.