18087434. AMPOULE FOR A SEMICONDUCTOR MANUFACTURING PRECURSOR simplified abstract (Applied Materials, Inc.)
AMPOULE FOR A SEMICONDUCTOR MANUFACTURING PRECURSOR
Organization Name
Inventor(s)
David Marquardt of Scottsdale AZ (US)
Jose Alexandro Romero of Scottsdale AZ (US)
AMPOULE FOR A SEMICONDUCTOR MANUFACTURING PRECURSOR - A simplified explanation of the abstract
This abstract first appeared for US patent application 18087434 titled 'AMPOULE FOR A SEMICONDUCTOR MANUFACTURING PRECURSOR
Simplified Explanation: The patent application describes ampoules used in semiconductor manufacturing for precursors, with a specific design to facilitate the flow of carrier gas in contact with the precursor.
Key Features and Innovation:
- Ampoules with inlet and outlet ports, inlet plenum, and outlet plenum for efficient gas flow.
- Flow path defined by tubular walls and flow ingress openings for carrier gas contact with the precursor.
Potential Applications: This technology can be applied in the semiconductor industry for the production of high-quality semiconductor materials.
Problems Solved: The technology addresses the need for precise control of carrier gas flow in contact with semiconductor precursors for optimal manufacturing processes.
Benefits:
- Improved efficiency in semiconductor manufacturing processes.
- Enhanced quality and consistency of semiconductor materials.
Commercial Applications: The technology can be utilized in semiconductor fabrication facilities to enhance production processes and product quality, potentially leading to cost savings and improved performance in electronic devices.
Prior Art: Readers can explore prior patents related to semiconductor manufacturing processes, gas flow control, and precursor handling to gain a deeper understanding of the technological landscape in this field.
Frequently Updated Research: Stay updated on advancements in semiconductor manufacturing techniques, gas flow control systems, and materials science research relevant to this technology.
Questions about Semiconductor Manufacturing Precursors: 1. How does the design of the ampoules impact the efficiency of carrier gas flow in semiconductor manufacturing? 2. What are the potential implications of this technology for the semiconductor industry in terms of cost savings and product quality?
Original Abstract Submitted
Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port and an outlet port. The ampoules comprise an inlet plenum located between the inlet port and the cavity and an outlet plenum located between the outlet port and the cavity. A flow path is defined by a plurality of tubular walls and a flow ingress openings of the ampoule adjacent bottom edges of the tubular walls, through which a carrier gas flows in contact with the precursor.