GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY

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Inventor(s)

GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY - A simplified explanation of the abstract

This abstract first appeared for US patent application 18048748 titled 'GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY

Simplified Explanation: The patent application relates to a method, system, and software application for controlling the transmittance rate of write beams and write gray tone patterns in lithography systems in a single exposure operation.

Key Features and Innovation:

Method to vary the local transmittance rate of shots to form varying step heights in the exposure area of a photoresist layer.
Enables the creation of complex patterns with different transmittance rates in a single exposure operation.

Potential Applications: This technology can be used in semiconductor manufacturing, microelectronics, and nanotechnology industries for creating intricate patterns with varying transmittance rates.

Problems Solved:

Allows for more efficient and precise control of transmittance rates in lithography processes.
Simplifies the production of complex patterns with varying step heights.

Benefits:

Improved accuracy and precision in creating patterns.
Increased efficiency in lithography processes.
Enables the production of advanced microelectronics and nanotechnology devices.

Commercial Applications: The technology can be applied in the production of semiconductors, microchips, sensors, and other high-tech devices, enhancing their performance and functionality.

Prior Art: Readers can explore prior patents related to lithography systems, transmittance control, and gray tone pattern generation to understand the existing technology landscape.

Frequently Updated Research: Stay updated on advancements in lithography systems, transmittance control methods, and software applications for improving pattern generation in the semiconductor industry.

Questions about Lithography Systems: 1. What are the key advantages of using varying transmittance rates in lithography processes? 2. How does this technology impact the development of advanced microelectronics and nanotechnology devices?

Original Abstract Submitted

Embodiments of the present disclosure generally relate to lithography systems. More particularly, embodiments of the present disclosure relate to a method, a system, and a software application for a lithography process to control transmittance rate of write beams and write gray tone patterns in a single exposure operation. In one embodiment, a plurality of shots are provided by an image projection system in a lithography system to a photoresist layer. The plurality of shots exposes the photoresist layer to an intensity of light emitted from the image projection system. The local transmittance rate of the plurality of shots within an exposure area is varied to form varying step heights in the exposure area of the photoresist layer.