17970872. Ru Liner above a Barrier Layer simplified abstract (Applied Materials, Inc.)
Ru Liner above a Barrier Layer
Organization Name
Inventor(s)
Zhaoxuan Wang of Sunnyvale CA (US)
Jianxin Lei of Fremont CA (US)
Wenting Hou of San Jose CA (US)
Sung-Kwan Kang of San Jose CA (US)
Anand Nilakantan Iyer of Fremont CA (US)
Ru Liner above a Barrier Layer - A simplified explanation of the abstract
This abstract first appeared for US patent application 17970872 titled 'Ru Liner above a Barrier Layer
Simplified Explanation: The patent application describes a method to create a layered substrate by depositing a diffusion barrier layer, an underlayer with a Group 6 metal, and a ruthenium layer on top.
- The method involves depositing a diffusion barrier layer on the substrate.
- An underlayer containing a Group 6 metal is then deposited on the barrier layer.
- Finally, a ruthenium layer comprising ruthenium is deposited on the underlayer to create the layered substrate.
Key Features and Innovation:
- Deposition of a diffusion barrier layer to enhance the substrate's properties.
- Use of a Group 6 metal in the underlayer for specific characteristics.
- Addition of a ruthenium layer for further functionality and performance.
Potential Applications: The technology can be applied in:
- Semiconductor manufacturing
- Thin film coatings
- Electronic device production
Problems Solved:
- Enhancing substrate durability
- Improving substrate conductivity
- Providing a stable base for additional layers
Benefits:
- Increased substrate performance
- Enhanced material properties
- Improved overall product quality
Commercial Applications: Title: Advanced Layered Substrate Technology for Semiconductor Manufacturing This technology can be utilized in various commercial applications such as:
- Integrated circuit production
- Solar panel manufacturing
- Optoelectronic device fabrication
Questions about Layered Substrate Technology: 1. How does the diffusion barrier layer contribute to the overall performance of the substrate? 2. What are the specific advantages of using a Group 6 metal in the underlayer?
Frequently Updated Research: Stay updated on the latest advancements in layered substrate technology to ensure optimal performance and efficiency in various industries.
Original Abstract Submitted
A method to produce a layered substrate, which includes the steps of depositing a diffusion barrier layer on the substrate; depositing an underlayer comprising a Group 6 metal on the barrier layer; and depositing a ruthenium layer comprising ruthenium on the underlayer, to produce the layered substrate. A layered substrate is also disclosed.