US Patent Application 18447911. DEPOSITION SYSTEM AND METHOD simplified abstract
Contents
DEPOSITION SYSTEM AND METHOD
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Hsuan-Chih Chu of Hsinchu (TW)
DEPOSITION SYSTEM AND METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18447911 titled 'DEPOSITION SYSTEM AND METHOD
Simplified Explanation
The patent application describes a deposition system that can clean itself by removing a deposited material from a collimator surface.
- The deposition system includes a substrate process chamber, a substrate pedestal, a target enclosure, a collimator, a vibration generating unit, and a cleaning gas outlet.
- The substrate pedestal supports a substrate, while the target enclosure surrounds the substrate process chamber.
- The collimator has hollow structures between the target and the substrate, which help control the deposition process.
- The vibration generating unit is used to generate vibrations that dislodge the deposited material from the collimator surface.
- The cleaning gas outlet is used to expel a cleaning gas that removes the dislodged material from the system.
Original Abstract Submitted
A deposition system is provided capable of cleaning itself by removing a target material deposited on a surface of a collimator. The deposition system in accordance with the present disclosure includes a substrate process chamber. The deposition includes a substrate pedestal in the substrate process chamber, the substrate pedestal configured to support a substrate, a target enclosing the substrate process chamber, and a collimator having a plurality of hollow structures disposed between the target and the substrate, a vibration generating unit, and cleaning gas outlet.
