US Patent Application 18057305. THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE AND ELECTRONIC SYSTEM INCLUDING THE SAME simplified abstract
THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE AND ELECTRONIC SYSTEM INCLUDING THE SAME
Organization Name
SAMSUNG ELECTRONICS CO., LTD.==Inventor(s)==
[[Category:Yunsun Jang of Suwon-si (KR)]]
[[Category:Jungtae Sung of Suwon-si (KR)]]
[[Category:Moorym Choi of Suwon-si (KR)]]
THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE AND ELECTRONIC SYSTEM INCLUDING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18057305 titled 'THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE AND ELECTRONIC SYSTEM INCLUDING THE SAME
Simplified Explanation
The patent application describes three-dimensional semiconductor memory devices and electronic systems.
- The memory device includes a first substrate with a cell array region and a contact region.
- A peripheral circuit structure is present on the first substrate.
- A cell array structure is stacked on the peripheral circuit structure, consisting of interlayer dielectric layers and gate electrodes.
- A dielectric layer is placed on top of the stack structure.
- A second substrate is placed on the stack structure.
- A mold structure made of dielectric material penetrates the stack structure.
- The mold structure contains a first through structure and a second through structure, which are spaced apart from each other.
Original Abstract Submitted
Disclosed are three-dimensional semiconductor memory devices and electronic systems. The three-dimensional semiconductor memory device includes a first substrate that includes a cell array region and a contact region, a peripheral circuit structure on the first substrate, a cell array structure on the peripheral circuit structure wherein the cell array structure includes interlayer dielectric layers and gate electrodes that are alternately stacked, a dielectric layer on the stack structure, and a second substrate on the stack structure, a mold structure that penetrates the stack structure and includes a dielectric material, and a first through structure and a second through structure that penetrate the mold structure and are spaced apart from each other.