Kioxia corporation (20240098999). SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR MEMORY DEVICE simplified abstract

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SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR MEMORY DEVICE

Organization Name

kioxia corporation

Inventor(s)

Junichi Hashimoto of Yokkaichi Mie (JP)

Toshiyuki Sasaki of Yokkaichi Mie (JP)

SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR MEMORY DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240098999 titled 'SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR MEMORY DEVICE

Simplified Explanation

The semiconductor memory device described in the patent application includes a stacked body with alternating layers of conductive and insulating materials, a pillar that penetrates through the stacked body, and varying thicknesses of insulating layers in different regions of the stacked body.

  • The semiconductor memory device includes a lower layer and a stacked body above it.
  • The stacked body consists of first conductive layers and first insulating layers alternately stacked.
  • A pillar penetrates through the stacked body to reach the lower layer.
  • At least one first insulating layer in a first region of the stacked body is thicker than the insulating layers in a second region above it.
  • The pillar has different bowing shapes at different heights within the stacked body.

Potential Applications

This technology could be applied in:

  • Semiconductor memory devices
  • Solid-state drives
  • Embedded systems

Problems Solved

This technology helps address:

  • Improved data storage capacity
  • Enhanced data transfer speeds
  • Increased durability of memory devices

Benefits

The benefits of this technology include:

  • Higher performance in memory devices
  • More efficient data storage
  • Longer lifespan of semiconductor memory devices

Potential Commercial Applications

The potential commercial applications of this technology could be in:

  • Consumer electronics
  • Data centers
  • Automotive industry

Possible Prior Art

One possible prior art for this technology could be the use of stacked structures in semiconductor devices to increase storage capacity and performance.

Unanswered Questions

How does the varying thickness of insulating layers affect the overall performance of the semiconductor memory device?

The varying thickness of insulating layers could impact the speed and efficiency of data transfer within the device.

What materials are used for the conductive and insulating layers in the stacked body?

The specific materials used for the conductive and insulating layers could influence the durability and reliability of the semiconductor memory device.


Original Abstract Submitted

according to one embodiment, a semiconductor memory device includes a lower layer, a stacked body above the lower layer with first conductive layers and first insulating layers alternately stacked. a pillar penetrates through the stacked body to reach the lower layer. at least one first insulating layer other than the lowest among the first insulating layers in a first region of the stacked body is thicker than first insulating layers in a second region above the first region. the pillar has a first bowing shape at the height of the at least one thicker first insulating layer and a second bowing shape at a height in the second region.