18327840. GERMANIUM PRECURSORS, METHODS OF FORMING THE GERMANIUM PRECURSORS, AND PRECURSOR COMPOSITIONS COMPRISING THE GERMANIUM PRECURSORS simplified abstract (Micron Technology, Inc.)
Contents
- 1 GERMANIUM PRECURSORS, METHODS OF FORMING THE GERMANIUM PRECURSORS, AND PRECURSOR COMPOSITIONS COMPRISING THE GERMANIUM PRECURSORS
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 GERMANIUM PRECURSORS, METHODS OF FORMING THE GERMANIUM PRECURSORS, AND PRECURSOR COMPOSITIONS COMPRISING THE GERMANIUM PRECURSORS - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Original Abstract Submitted
GERMANIUM PRECURSORS, METHODS OF FORMING THE GERMANIUM PRECURSORS, AND PRECURSOR COMPOSITIONS COMPRISING THE GERMANIUM PRECURSORS
Organization Name
Inventor(s)
Gurtej S. Sandhu of Boise ID (US)
Sumeet C. Pandey of Boise ID (US)
Stefan Uhlenbrock of Boise ID (US)
John A. Smythe of Boise ID (US)
GERMANIUM PRECURSORS, METHODS OF FORMING THE GERMANIUM PRECURSORS, AND PRECURSOR COMPOSITIONS COMPRISING THE GERMANIUM PRECURSORS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18327840 titled 'GERMANIUM PRECURSORS, METHODS OF FORMING THE GERMANIUM PRECURSORS, AND PRECURSOR COMPOSITIONS COMPRISING THE GERMANIUM PRECURSORS
Simplified Explanation
The abstract describes a germanium precursor with a specific chemical formula and various possible substituents. It also mentions methods of forming the precursor and a precursor composition including the germanium precursor.
- The germanium precursor has a chemical formula of Ge(RNC(R)NR)(R), where R, R, R, and R can be hydrogen, alkyl, substituted alkyl, alkoxide, substituted amide, amine, substituted amine, or halogen.
- The patent application discloses methods of forming the germanium precursor.
- The patent application also discloses a precursor composition that includes the germanium precursor.
Potential Applications
- The germanium precursor can be used in the production of germanium-containing materials, such as semiconductors and optical devices.
- It can be utilized in the synthesis of germanium nanoparticles or nanowires for various applications, including electronics and energy storage.
- The precursor composition can be employed in the development of new germanium-based compounds with specific properties and functionalities.
- The germanium precursor may find applications in the field of catalysis, as germanium compounds can exhibit catalytic activity in certain reactions.
- It can also be used in the production of germanium-based polymers or coatings with unique properties, such as thermal stability or electrical conductivity.
Original Abstract Submitted
A germanium precursor comprising a chemical formula of Ge(RNC(R)NR)(R) where each of R, R, R, and Ris independently selected from the group consisting of hydrogen, an alkyl, a substituted alkyl, an alkoxide, a substituted amide, an amine, a substituted amine, and a halogen. Methods of forming the germanium precursor and a precursor composition including the germanium precursor are also disclosed.
