17898184. APPARATUS INCLUDING ADJUSTED WELLS AND METHODS OF MANUFACTURING THE SAME simplified abstract (Micron Technology, Inc.)
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APPARATUS INCLUDING ADJUSTED WELLS AND METHODS OF MANUFACTURING THE SAME
Organization Name
Inventor(s)
Michael A. Smith of Boise ID (US)
APPARATUS INCLUDING ADJUSTED WELLS AND METHODS OF MANUFACTURING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 17898184 titled 'APPARATUS INCLUDING ADJUSTED WELLS AND METHODS OF MANUFACTURING THE SAME
Simplified Explanation
The patent application describes semiconductor devices with an adjusted bottom/deep well embedded in a semiconductor substrate, where the adjusted bottom/deep well has specific characteristics due to being formed using a temporary masked layer.
- Adjusted bottom/deep well embedded in a semiconductor substrate
- Characteristics of the adjusted bottom/deep well result from being formed using a temporary masked layer
Potential Applications
- Semiconductor manufacturing
- Integrated circuits
- Electronic devices
Problems Solved
- Enhanced performance of semiconductor devices
- Improved efficiency in semiconductor manufacturing
- Increased reliability of integrated circuits
Benefits
- Customization of semiconductor device characteristics
- Greater control over semiconductor manufacturing process
- Enhanced functionality of electronic devices
Original Abstract Submitted
Semiconductor devices including an adjusted bottom/deep well embedded in a semiconductor substrate. The adjusted bottom/deep well having one or more characteristics resulting from being formed using or through a temporary masked layer.
