17830145. MEMORY CELL CAPACITOR STRUCTURES FOR THREE-DIMENSIONAL MEMORY ARRAYS simplified abstract (Micron Technology, Inc.)

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MEMORY CELL CAPACITOR STRUCTURES FOR THREE-DIMENSIONAL MEMORY ARRAYS

Organization Name

Micron Technology, Inc.

Inventor(s)

Sheyang Ning of San Jose CA (US)

Song Guo of Boise ID (US)

Yuan He of Boise ID (US)

MEMORY CELL CAPACITOR STRUCTURES FOR THREE-DIMENSIONAL MEMORY ARRAYS - A simplified explanation of the abstract

This abstract first appeared for US patent application 17830145 titled 'MEMORY CELL CAPACITOR STRUCTURES FOR THREE-DIMENSIONAL MEMORY ARRAYS

Simplified Explanation

Methods, systems, and devices for memory cell capacitor structures for three-dimensional memory arrays are described in this patent application. The memory device includes a memory array with multiple levels of memory cells, each separated by a dielectric layer. Each memory cell at a first level includes a channel portion and a capacitor to store its logic state. The capacitor has a first portion located between the channel portion and a voltage source, and a second portion in a cavity in a dielectric layer between the first and second levels of the memory array. The second portion of the capacitor is located between the channel portion and a word line coupled with a channel portion of a second memory cell at the second level.

  • Memory device with multiple levels of memory cells
  • Capacitor structure to store logic state of memory cells
  • First portion of capacitor located between channel portion and voltage source
  • Second portion of capacitor in a cavity in a dielectric layer between levels
  • Second portion of capacitor located between channel portion and word line of second memory cell

Potential Applications

  • Three-dimensional memory arrays
  • High-density memory devices
  • Data storage in electronic devices

Problems Solved

  • Increasing memory density in limited space
  • Efficient storage of logic states in memory cells
  • Reducing interference between memory cells

Benefits

  • Higher memory capacity in smaller footprint
  • Improved performance and reliability of memory devices
  • Enhanced data storage capabilities in electronic devices


Original Abstract Submitted

Methods, systems, and devices for memory cell capacitor structures for three-dimensional memory arrays are described. A memory device may include a memory array including multiple levels of memory cells that are each separated from another level by a respective dielectric layer. A memory cell at a first level of the memory array may include a channel portion and a capacitor operable to store a logic state of the memory cell. A first portion of the capacitor may be located between the channel portion and a voltage source coupled with the memory cell. A second portion of the capacitor may be in a cavity in a dielectric layer between the first level and a second level of the memory array. The second portion of the capacitor may be located between the channel portion and a word line coupled with a channel portion of a second memory cell at the second level.