17384310. DEPOSITION SYSTEM AND METHOD simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
Contents
DEPOSITION SYSTEM AND METHOD
Organization Name
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Inventor(s)
Hsuan-Chih Chu of Hsinchu (TW)
DEPOSITION SYSTEM AND METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 17384310 titled 'DEPOSITION SYSTEM AND METHOD
Simplified Explanation
The abstract describes a deposition system that can clean itself by removing a deposited material from a collimator surface. The system includes a substrate process chamber, a substrate pedestal, a target enclosure, a collimator with hollow structures, a vibration generating unit, and a cleaning gas outlet.
- The deposition system has a substrate process chamber where deposition takes place.
- A substrate pedestal is present in the chamber to support the substrate.
- The target enclosure surrounds the substrate process chamber.
- A collimator with hollow structures is positioned between the target and the substrate.
- A vibration generating unit is included to facilitate the cleaning process.
- A cleaning gas outlet is provided to remove the target material from the collimator surface.
Potential Applications
- Semiconductor manufacturing: This deposition system can be used in the production of semiconductors, where precise deposition and self-cleaning capabilities are crucial.
- Thin film coating: The system can be employed in industries that require thin film coatings, such as optics, solar panels, and display technologies.
Problems Solved
- Target material deposition: The system addresses the issue of target material being deposited on the collimator surface, which can affect the quality of the deposition process.
- Cleaning efficiency: By incorporating a self-cleaning mechanism, the system ensures that the collimator remains clean and free from deposited material, leading to improved performance and reliability.
Benefits
- Improved deposition quality: The self-cleaning feature of the system ensures that the collimator remains free from deposited material, resulting in more precise and consistent deposition.
- Reduced maintenance: With the ability to clean itself, the system minimizes the need for manual cleaning and maintenance, saving time and resources.
- Enhanced productivity: The self-cleaning capability allows for longer uninterrupted deposition runs, increasing overall productivity and efficiency.
Original Abstract Submitted
A deposition system is provided capable of cleaning itself by removing a target material deposited on a surface of a collimator. The deposition system in accordance with the present disclosure includes a substrate process chamber. The deposition includes a substrate pedestal in the substrate process chamber, the substrate pedestal configured to support a substrate, a target enclosing the substrate process chamber, and a collimator having a plurality of hollow structures disposed between the target and the substrate, a vibration generating unit, and cleaning gas outlet.
