US Patent Application 18324260. CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME simplified abstract
Contents
- 1 CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME
- 1.1 Organization Name
- 1.2 CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME - A simplified explanation of the abstract
- 1.3 Simplified Explanation
- 1.4 Original Abstract Submitted
CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME
Organization Name
SAMSUNG ELECTRONICS CO., LTD.==Inventor(s)==
[[Category:Byungjoon Kang of Suwon-si (KR)]]
[[Category:Jiwon Kim of Hwaseong-si (KR)]]
[[Category:Sungmin Kim of Suwon-si (KR)]]
[[Category:Hwang Suk Kim of Suwon-si (KR)]]
[[Category:Jungmin Oh of Hwaseong-si (KR)]]
[[Category:Hyosan Lee of Hwaseong-si (KR)]]
[[Category:Byoungki Choi of Suwon-si (KR)]]
[[Category:Cheol Ham of Suwon-si (KR)]]
[[Category:Kyuyoung Hwang of Suwon-si (KR)]]
CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18324260 titled 'CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME
Simplified Explanation
- The patent application describes a cleaning composition for removing residues on surfaces. - The composition does not contain an oxidant. - The composition includes a solvent and a cleaning accelerator. - The cleaning accelerator can be a salt represented by Formula 1A or a salt represented by Formula 1B. - The patent application also describes a method of cleaning a metal-containing film using the cleaning composition. - The method involves preparing the cleaning composition and bringing it into contact with a metal-containing film on a substrate. - The metal-containing film has a surface on which residues are generated.
Original Abstract Submitted
A cleaning composition for removing residues on surfaces contains a solvent and a cleaning accelerator, but does not contain an oxidant, wherein the cleaning accelerator includes at least one of a salt represented by Formula 1A or a salt represented by Formula 1B. A method of cleaning a metal-containing film includes preparing the cleaning composition, and bring the cleaning composition into contact with a metal-containing film provided on a substrate, the metal-containing film having a surface on which residues are generated. The Formulae 1A and 1B are:
