US Patent Application 18213294. PROCESSING SYSTEM, PROCESSING METHOD, MEASUREMENT APPARATUS, SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract

From WikiPatents
Jump to navigation Jump to search

PROCESSING SYSTEM, PROCESSING METHOD, MEASUREMENT APPARATUS, SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD

Organization Name

CANON KABUSHIKI KAISHA


Inventor(s)

Shinichi Egashira of Tochigi (JP)

PROCESSING SYSTEM, PROCESSING METHOD, MEASUREMENT APPARATUS, SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract

This abstract first appeared for US patent application 18213294 titled 'PROCESSING SYSTEM, PROCESSING METHOD, MEASUREMENT APPARATUS, SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD

Simplified Explanation

The present invention is a processing system that consists of two apparatuses and is used to process a substrate.

  • The first apparatus has a measurement unit that can detect and measure the position of a first structure and a second structure on the substrate.
  • The second apparatus has an obtainment unit that can obtain the relative position between the first structure and the second structure measured by the first apparatus.
  • The second apparatus also has a measurement unit that can detect and measure the position of the second structure.
  • The second apparatus further includes a control unit that can calculate the position of the first structure based on the relative position obtained from the first apparatus and the position of the second structure measured by the second apparatus.


Original Abstract Submitted

The present invention provides a processing system that includes a first apparatus and a second apparatus, and processes a substrate, wherein the first apparatus includes a first measurement unit configured to detect a first structure and a second structure different from the first structure provided on the substrate, and measure a relative position between the first structure and the second structure, and the second apparatus includes an obtainment unit configured to obtain the relative position measured by the first measurement unit, a second measurement unit configured to detect the second structure and measure a position of the second structure, and a control unit configured to obtain a position of the first structure based on the relative position obtained by the obtainment unit and the position of the second structure measured by the second measurement unit.

Retrieved from "http://wikipatents.org/index.php?title=US_Patent_Application_18213294._PROCESSING_SYSTEM,_PROCESSING_METHOD,_MEASUREMENT_APPARATUS,_SUBSTRATE_PROCESSING_APPARATUS_AND_ARTICLE_MANUFACTURING_METHOD_simplified_abstract&oldid=7471"