Tokyo electron limited (20240248417). SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract
Contents
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
Organization Name
Inventor(s)
Shingo Katsuki of Kumamoto (JP)
Ryohei Fujise of Kumamoto (JP)
Kenichirou Matsuyama of Kumamoto (JP)
Shinsuke Takaki of Kumamoto (JP)
Tomoya Onitsuka of Kumamoto (JP)
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240248417 titled 'SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
The abstract describes a substrate processing apparatus with two transfer paths for substrates at different stages of processing, along with nitrogen atmosphere placement stages to create a nitrogen-rich environment for the substrates.
- Simplified Explanation:
- The apparatus has two transfer paths for substrates before and after exposure. - Nitrogen atmosphere stages create a high nitrogen environment for the substrates.
- Key Features and Innovation:
- Dual transfer paths for substrates at different processing stages. - Nitrogen atmosphere stages for a nitrogen-rich environment. - Enhanced substrate processing conditions.
- Potential Applications:
- Semiconductor manufacturing. - Thin film deposition processes. - Photolithography processes.
- Problems Solved:
- Ensures optimal processing conditions for substrates. - Minimizes contamination risks. - Improves overall process efficiency.
- Benefits:
- Enhanced substrate quality. - Increased process reliability. - Improved yield in manufacturing processes.
- Commercial Applications:
- Semiconductor fabrication facilities. - Thin film coating industries. - Photolithography equipment manufacturers.
- Questions about Substrate Processing Apparatus:
1. How does the nitrogen-rich environment benefit substrate processing? - The nitrogen-rich environment helps reduce contamination and improve process reliability.
2. What are the key advantages of having dual transfer paths in the apparatus? - Dual transfer paths allow for optimized processing conditions at different stages of substrate processing.
Original Abstract Submitted
a substrate processing apparatus includes a first transfer path that is a transfer path for a substrate after mor film formation and before exposure, and a second transfer path that is a transfer path for the substrate after exposure; and one or a plurality of nitrogen atmosphere placement stages provided on at least one of the first transfer path and the second transfer path and configured to place the substrate in an environment with a nitrogen concentration of an atmosphere set higher than that of air.
