Tokyo Electron Limited patent applications published on September 26th, 2024
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Contents
- 1 Patent applications for Tokyo Electron Limited on September 26th, 2024
- 1.1 FILM FORMING APPARATUS (18608057)
- 1.2 PATTERN FORMING METHOD AND PLASMA PROCESSING METHOD (18574204)
- 1.3 SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSING METHOD (18578448)
- 1.4 POSITION DETECTION METHOD AND SUBSTRATE PROCESSING APPARATUS (18606633)
- 1.5 PLASMA PROCESSING APPARATUS (18612075)
- 1.6 Impedance Matching Network and Control Method (18187558)
- 1.7 ETCHING METHOD AND PLASMA PROCESSING APPARATUS (18611755)
- 1.8 PLASMA PROCESSING APPARATUS (18609340)
- 1.9 PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (18680297)
- 1.10 INSULATING FILM FORMING METHOD AND SUBSTRATE PROCESSING SYSTEM (18609278)
- 1.11 SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSING METHOD (18573615)
- 1.12 Inner Wall and substrate Processing Apparatus (18733073)
- 1.13 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS (18579056)
Patent applications for Tokyo Electron Limited on September 26th, 2024
FILM FORMING APPARATUS (18608057)
Main Inventor
Tatsuya YAMAGUCHI
PATTERN FORMING METHOD AND PLASMA PROCESSING METHOD (18574204)
Main Inventor
Shin OOWADA
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSING METHOD (18578448)
Main Inventor
Kazuyuki Goto
POSITION DETECTION METHOD AND SUBSTRATE PROCESSING APPARATUS (18606633)
Main Inventor
Hikaru SATO
PLASMA PROCESSING APPARATUS (18612075)
Main Inventor
Masaki HIRAYAMA
Impedance Matching Network and Control Method (18187558)
Main Inventor
John Carroll
ETCHING METHOD AND PLASMA PROCESSING APPARATUS (18611755)
Main Inventor
Yoshinari HATAZAKI
PLASMA PROCESSING APPARATUS (18609340)
Main Inventor
Satoshi TAGA
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (18680297)
Main Inventor
Koki MUKAIYAMA
INSULATING FILM FORMING METHOD AND SUBSTRATE PROCESSING SYSTEM (18609278)
Main Inventor
Daisuke OBA
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSING METHOD (18573615)
Main Inventor
Takanori Obaru
Inner Wall and substrate Processing Apparatus (18733073)
Main Inventor
Yuji ASAKAWA
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS (18579056)
Main Inventor
Yuji OTSUKI