Tokyo Electron Limited patent applications published on September 12th, 2024

Summary of the patent applications from Tokyo Electron Limited on September 12th, 2024

1. 'Summary': Tokyo Electron Limited has recently filed patents for innovative semiconductor fabrication methods and apparatus. These patents involve techniques such as forming multilayered stacks with sacrificial layers, creating gate-all-around structures, and using ceramic materials for gas delivery tubes in semiconductor processing equipment. The bonding apparatus described in another patent ensures precise alignment and efficient bonding of substrates. Additionally, a substrate processing method involving two etching processes with varying rates has been patented.

2. 'Key Points of Patents':

• Fabrication method involving multilayered stacks with sacrificial layers and gate-all-around structures.
• Method for creating a forksheet semiconductor structure with insulation wall trenches.
• Semiconductor processing apparatus with ceramic gas delivery tubes and pedestal shaft.
• Bonding apparatus for precise alignment and bonding of substrates.
• Substrate processing method with two etching processes for different etching rates.

3. 'Notable Applications':

• Improved performance and efficiency in semiconductor devices.
• Enhanced insulation and structural integrity in semiconductor structures.
• Increased efficiency and reliability in semiconductor fabrication processes.
• Precise alignment and efficient bonding of delicate materials in microelectronics assembly.
• Higher quality semiconductor products and increased productivity in the industry.

Patent applications for Tokyo Electron Limited on September 12th, 2024

SUBSTRATE POSITIONING DEVICE, SUBSTRATE POSITIONING METHOD, AND BONDING APPARATUS (18595890)

Main Inventor

Tetsuya Maki

DEPOSITION APPARATUS AND DEPOSITION METHOD (18583059)

Main Inventor

Hiroki MURAKAMI

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD (18589845)

Main Inventor

Tatsuya YAMAGUCHI

ANTENNA AND PLASMA PROCESSING APPARATUS (18668645)

Main Inventor

Hitoshi KATO

PLASMA PROCESSING APPARATUS, CONTROL METHOD, POWER SUPPLY SYSTEM, AND STORAGE MEDIUM (18665826)

Main Inventor

Chishio KOSHIMIZU

FILTER CIRCUIT (18668416)

Main Inventor

Yohei YAMAZAWA

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS (18546140)

Main Inventor

Miyako KANEKO

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS (18273116)

Main Inventor

Koji AKIYAMA

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS (18701058)

Main Inventor

Tsunemoto OGATA

BONDING APPARATUS, BONDING SYSTEM, AND BONDING METHOD (18598273)

Main Inventor

Kenji Sugakawa

Ceramic Pedestal Shaft with Heated/Cooled Gas Tube (18179503)

Main Inventor

Melvin Verbaas

METHOD OF SELF-ALIGNED DIELECTRIC WALL FORMATION FOR FORKSHEET APPLICATION (18178665)

Main Inventor

Eric Chih-Fang LIU

METHOD OF 3D CANTILEVER CHANNEL FORMATION (18182066)

Main Inventor

H. Jim FULFORD