Tokyo Electron Limited patent applications published on July 4th, 2024

Summary of the patent applications from Tokyo Electron Limited on July 4th, 2024

1. Summary: Tokyo Electron Limited has recently filed patents for innovative technologies in the semiconductor manufacturing industry. These patents include a wireless power supply system for semiconductor manufacturing systems, an advanced substrate transfer system using magnetic floating technology, and a temperature control device for precise temperature regulation during substrate processing. These technologies aim to streamline processes, improve efficiency, and enhance overall productivity in semiconductor manufacturing.

2. Key Points of Patents:

• Wireless Power Supply System:

- Power supply system for semiconductor manufacturing systems. - Power feeding devices wirelessly transmit power to manufacturing systems. - Adjusts power supply based on power use status.

• Advanced Substrate Transfer System:

- Utilizes magnetic floating technology for precise substrate transfer. - Enhances productivity and safety in substrate handling. - Connects substrate processing and transfer chambers for efficient operations.

• Temperature Control Device:

- Main tank stores heating medium with sub-tanks above and below a reference point. - Connector pipes with valves regulate heating medium flow. - Controller circuit adjusts valves based on liquid amount in the main tank.

3. Notable Applications: - Increased flexibility and scalability in semiconductor manufacturing processes. - Improved energy efficiency and cost savings. - Enhanced substrate handling safety and productivity. - Optimized temperature control for precise substrate processing.

Patent applications for Tokyo Electron Limited on July 4th, 2024

CONTAINER (18557744)

Main Inventor

Katsuhiro Tsuchiya

PLASMA PROCESSING APPARATUS (18605275)

Main Inventor

Naoki MATSUMOTO

PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, PROGRAM, AND STORAGE MEDIUM (18607327)

Main Inventor

Gen TAMAMUSHI

PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, PROGRAM, AND STORAGE MEDIUM (18605996)

Main Inventor

Yuto KOSAKA

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS INCLUDING APPLYING A VOLTAGE TO A LOWER ELECTRODE IN A SUBSTRATE SUPPORT WITH A GAS SUPPLIED INTO A CHAMBER (18605902)

Main Inventor

Koichiro NAKAMURA

PLASMA PROCESSING APPARATUS (18541526)

Main Inventor

Takashi ARAMAKI

ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS (18606213)

Main Inventor

Koei ITO

PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK INCLUDING A DIELECTRIC STRUCTURE AND AN ELECTROSTATIC CLAIM ELECTRODE INSIDE THE DIELECTRIC STRUCTURE (18606853)

Main Inventor

Takahiko SATO

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (18605369)

Main Inventor

Takashi YAMAMURA

NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR (18605526)

Main Inventor

Shan HU

METHODS FOR FORMING SEMICONDUCTOR DEVICES USING MODIFIED PHOTOMASK LAYER (18090436)

Main Inventor

Peng WANG

DENSIFICATION AND REDUCTION OF SELECTIVELY DEPOSITED Si PROTECTIVE LAYER FOR MASK SELECTIVITY IMPROVEMENT IN HAR ETCHING (18090434)

Main Inventor

Jinying Lin

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS (18608043)

Main Inventor

Song yun Kang

TEMPERATURE CONTROL DEVICE, SUBSTRATE PROCESSING APPARATUS, AND LIQUID AMOUNT CONTROL METHOD (18607400)

Main Inventor

Kei KOBAYASHI

SUBSTRATE TRANSFER SYSTEM (18605892)

Main Inventor

Tatsuru OKAMURA

APPARATUS FOR PROCESSING SUBSTRATE AND METHOD OF TRANSFERRING SUBSTRATE (18609164)

Main Inventor

Takehiro SHINDO

POWER SUPPLY SYSTEM FOR SEMICONDUCTOR MANUFACTURING SYSTEM GROUP (18605837)

Main Inventor

Naoki MATSUMOTO