Tokyo Electron Limited patent applications published on December 19th, 2024

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Patent applications for Tokyo Electron Limited on December 19th, 2024

PROCESSING METHOD AND PROCESSING SYSTEM (18706115)

Main Inventor

Kazuya HISANO


OPTICAL SENSOR FOR FILM THICKNESS MEASUREMENT (18501672)

Main Inventor

Ivan MALEEV


FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVERCOAT (18615313)

Main Inventor

Michael Murphy


APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES (18814175)

Main Inventor

Mirko Vukovic


HYBRID MODELING FOR FILM METROLOGY (18535103)

Main Inventor

Yan CHEN


PROFILE DETECTING METHOD AND PROFILE DETECTING APPARATUS (18820492)

Main Inventor

Toshihiro KITAO


PLASMA PROCESSING APPARATUS (18741841)

Main Inventor

Manabu ISHIKAWA


METHOD OF DEPOSITION IN HIGH ASPECT RATIO (HAR) FEATURES (18337281)

Main Inventor

Shihsheng Chang


LIQUID CIRCULATION SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND LIQUID CIRCULATION METHOD (18703525)

Main Inventor

Takao OKABE


SYSTEMS AND METHODS FOR DETERMINING A LOCALIZED FLUID VELOCITY ON A SPINNING SUBSTRATE BY TRACKING MOVEMENT OF A TRACER ACROSS THE SPINNING SUBSTRATE (18210762)

Main Inventor

Michael Carcasi


SYSTEMS AND METHODS FOR DETERMINING A LOCALIZED FLUID VELOCITY OF A PROCESSING LIQUID DISPENSED ON A SPINNING SUBSTRATE BY TRACKING MOVEMENT OF AN INDUCED PERTURBATION IN THE PROCESSING LIQUID ACROSS THE SPINNING SUBSTRATE ([[Tokyo Electron Limited (18210772). SYSTEMS AND METHODS FOR DETERMINING A LOCALIZED FLUID VELOCITY OF A PROCESSING LIQUID DISPENSED ON A SPINNING SUBSTRATE BY TRACKING MOVEMENT OF AN INDUCED PERTURBATION IN THE PROCESSING LIQUID ACROSS THE SPINNING SUBSTRATE|18210772]])

Main Inventor

Michael Carcasi


SYSTEMS AND METHODS FOR DETERMINING A FLUID HEIGHT AND/OR A FLUID VELOCITY ON A SPINNING SUBSTRATE (18210773)

Main Inventor

Michael Carcasi