Texas instruments incorporated (20240339457). CONTAMINANT COLLECTION ON SOI simplified abstract
Contents
CONTAMINANT COLLECTION ON SOI
Organization Name
texas instruments incorporated
Inventor(s)
Frank John Sweeney of Rockwall TX (US)
CONTAMINANT COLLECTION ON SOI - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240339457 titled 'CONTAMINANT COLLECTION ON SOI
Simplified Explanation: The patent application describes an integrated circuit with an SOI substrate containing a semiconductor layer over a buried insulator layer. An electronic device within the circuit includes an nwell region, a dielectric layer, and a polysilicon plate. A white space region adjacent to the electronic device has a first p-type region with a specific sheet resistance, while the nwell region has a higher sheet resistance.
- The integrated circuit features an SOI substrate with a semiconductor layer over a buried insulator layer.
- An electronic device within the circuit includes an nwell region, a dielectric layer, and a polysilicon plate.
- A white space region adjacent to the electronic device contains a first p-type region with a specific sheet resistance.
- The nwell region within the electronic device has a higher sheet resistance compared to the p-type region in the white space area.
Potential Applications: 1. Semiconductor manufacturing 2. Integrated circuit design 3. Electronic device production
Problems Solved: 1. Enhancing the performance of electronic devices 2. Improving the efficiency of integrated circuits
Benefits: 1. Increased functionality of electronic devices 2. Enhanced reliability of integrated circuits
Commercial Applications: Title: Advanced Semiconductor Manufacturing Techniques This technology could be utilized in the production of high-performance electronic devices, leading to advancements in various industries such as telecommunications, consumer electronics, and automotive.
Prior Art: Readers interested in exploring prior art related to this technology may refer to patents in the field of semiconductor manufacturing, SOI substrates, and integrated circuit design.
Frequently Updated Research: Researchers in the field of semiconductor technology are constantly working on improving the performance and efficiency of integrated circuits through innovative techniques such as those described in this patent application.
Questions about Integrated Circuits: 1. How do integrated circuits impact modern technology? Integrated circuits are essential components in various electronic devices, enabling the miniaturization and increased functionality of technology. 2. What are the key challenges in developing advanced integrated circuits? Developing advanced integrated circuits involves overcoming obstacles related to power consumption, heat dissipation, and manufacturing complexity.
Original Abstract Submitted
an integrated circuit includes an soi substrate having a semiconductor layer over a buried insulator layer. an electronic device has an nwell region in the semiconductor layer, a dielectric over the nwell region, and a polysilicon plate over the dielectric. a white space region adjacent the electronic device includes a first p-type region in the semiconductor layer and adjacent the surface. the p-type region has a first sheet resistance and the nwell region has a second sheet resistance that is greater than the first sheet resistance.
