Texas instruments incorporated (20240177977). SEMICONDUCTOR PROCESSING TOOL CLEANING simplified abstract
Contents
- 1 SEMICONDUCTOR PROCESSING TOOL CLEANING
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SEMICONDUCTOR PROCESSING TOOL CLEANING - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
SEMICONDUCTOR PROCESSING TOOL CLEANING
Organization Name
texas instruments incorporated
Inventor(s)
Gregory Mckee of Riverton UT (US)
SEMICONDUCTOR PROCESSING TOOL CLEANING - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240177977 titled 'SEMICONDUCTOR PROCESSING TOOL CLEANING
Simplified Explanation
The present disclosure relates to semiconductor processing tool cleaning using boron trichloride gas.
- Boron trichloride gas is flowed into the chamber to clean the interior surface.
- The cleaning process removes material layers from semiconductor substrates.
- The use of boron trichloride gas ensures effective cleaning without the need for additional chemicals.
Potential Applications
The technology can be applied in semiconductor manufacturing processes to ensure clean and efficient operation of processing tools.
Problems Solved
The technology solves the problem of maintaining clean interior surfaces of semiconductor processing tools, which is crucial for the quality and reliability of integrated circuits.
Benefits
- Improved cleanliness and efficiency in semiconductor processing tools - Reduced need for additional cleaning chemicals - Enhanced performance and reliability of integrated circuits
Potential Commercial Applications
"Semiconductor Processing Tool Cleaning Using Boron Trichloride Gas" can be used in semiconductor fabrication facilities to optimize cleaning processes and improve overall manufacturing efficiency.
Possible Prior Art
One possible prior art could be the use of other reactive gases for cleaning semiconductor processing tools, but the exclusive use of boron trichloride gas as described in this disclosure may be a novel approach.
Unanswered Questions
How does the use of boron trichloride gas compare to other cleaning methods in terms of effectiveness and cost-efficiency?
The article does not provide a direct comparison between boron trichloride gas and other cleaning methods in terms of effectiveness and cost-efficiency. Further research or testing may be needed to determine the advantages of using boron trichloride gas over other options.
What safety measures need to be taken when handling boron trichloride gas in semiconductor processing facilities?
The article does not discuss specific safety measures for handling boron trichloride gas in semiconductor processing facilities. It is important to consider the potential hazards associated with this gas and implement appropriate safety protocols to protect workers and the environment.
Original Abstract Submitted
the present disclosure generally relates to semiconductor processing tool cleaning, such as may be included in semiconductor processing for manufacturing an integrated circuit (ic). in an example, a cleaning process is performed on an interior surface of a chamber of a semiconductor processing tool. the cleaning process includes flowing a reactive gas into an interior volume of the chamber. the interior volume is defined at least in part by the interior surface. the reactive gas consists exclusively of boron trichloride (bcl). after performing the cleaning process, a material layer over a semiconductor substrate is etched in the chamber.
