Taiwan semiconductor manufacturing company, ltd. (20240347624). Inner Spacer Liner simplified abstract
Contents
Inner Spacer Liner
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Jin-Mu Yin of Kaohsiung City (TW)
Wei-Yang Lee of Taipei City (TW)
Chih-Hao Yu of Tainan City (TW)
Yen-Ting Chen of Taichung City (TW)
Chia-Pin Lin of Hsinchu County (TW)
Inner Spacer Liner - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240347624 titled 'Inner Spacer Liner
The present disclosure introduces a semiconductor device and a method for its formation. The semiconductor device includes a first source/drain feature, a second source/drain feature, multiple channel members, inner spacer features, a gate structure, and a semiconductor liner.
- The semiconductor device consists of a complex structure with various components such as source/drain features, channel members, inner spacer features, gate structure, and semiconductor liner.
- The gate structure wraps around each channel member, providing control over the flow of electrical current.
- The semiconductor liner is positioned between the gate structure and inner spacer features, enhancing the performance and reliability of the device.
- The innovative design of the semiconductor device aims to improve efficiency and functionality in electronic applications.
- By optimizing the arrangement of components, the semiconductor device offers enhanced performance and reliability in various electronic devices.
Potential Applications: - This technology can be applied in the manufacturing of advanced semiconductor devices for consumer electronics, communication systems, and computing devices. - It can also be utilized in the development of high-performance integrated circuits for industrial and automotive applications.
Problems Solved: - The semiconductor device addresses the need for improved performance and reliability in electronic devices. - It offers a more efficient and effective solution for controlling electrical currents in semiconductor components.
Benefits: - Enhanced performance and reliability in electronic devices. - Improved efficiency and functionality in semiconductor applications. - Potential for advancements in the field of integrated circuits and electronic systems.
Commercial Applications: - The semiconductor device has significant commercial potential in the consumer electronics, communication, and automotive industries. - It can lead to the development of more advanced and reliable electronic devices, catering to the growing demand for high-performance technology.
Questions about the Semiconductor Device: 1. How does the semiconductor liner contribute to the overall performance of the device? 2. What are the key advantages of the gate structure wrapping around each channel member?
Original Abstract Submitted
the present disclosure provides a semiconductor device and a method of forming the same. a semiconductor device according to the present disclosure includes a first source/drain feature and a second source/drain feature over a substrate, a plurality of channel members extending between the first source/drain feature and the second source/drain feature, a plurality of inner spacer features interleaving the plurality of channel members, a gate structure wrapping around each of the plurality of channel members, and a semiconductor liner sandwiched between the gate structure and each of the plurality of inner spacer features.
