Taiwan semiconductor manufacturing company, ltd. (20240345485). ADDITIVE FOR LITHOGRAPHY simplified abstract
Contents
ADDITIVE FOR LITHOGRAPHY
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Ching-Yu Chang of Yilang County (TW)
An-Ren Zi of Hsinchu City (TW)
Yuan Chih Lo of Hsinchu City (TW)
Shi-Cheng Wang of Tainan City (TW)
ADDITIVE FOR LITHOGRAPHY - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240345485 titled 'ADDITIVE FOR LITHOGRAPHY
The method described in the abstract involves forming a target layer on a substrate, followed by the formation of a resist layer on top of the target layer. The resist layer is then exposed to produce secondary electrons, which are terminated using an additive. Subsequently, the resist layer is developed, and the target layer is etched using the developed resist layer as a mask.
- Formation of a target layer on a substrate
- Creation of a resist layer on the target layer
- Exposure of the resist layer to generate secondary electrons
- Termination of secondary electrons using an additive
- Development of the resist layer
- Etching of the target layer using the developed resist layer as a mask
Potential Applications: - Semiconductor manufacturing - Microelectronics fabrication - Photolithography processes
Problems Solved: - Improving precision in etching processes - Enhancing the quality of semiconductor devices - Increasing efficiency in microelectronics production
Benefits: - Higher accuracy in etching - Improved device performance - Cost-effective manufacturing processes
Commercial Applications: Title: Advanced Etching Technology for Semiconductor Industry This technology can be utilized in semiconductor manufacturing plants to enhance the quality and efficiency of production processes. It can lead to the development of more advanced and reliable semiconductor devices, catering to a wide range of industries.
Prior Art: Readers can explore prior research in the field of semiconductor manufacturing, photolithography, and etching processes to gain a deeper understanding of the advancements made in this area.
Frequently Updated Research: Stay updated on the latest developments in semiconductor manufacturing, etching techniques, and microelectronics fabrication to keep abreast of new innovations and technologies.
Questions about Advanced Etching Technology: 1. How does this method improve the precision of etching processes? 2. What are the potential challenges in implementing this technology in semiconductor manufacturing?
Original Abstract Submitted
a method includes the following steps. a target layer is formed on a substrate. a resist layer is formed on the target layer. the resist layer is exposed such that secondary electrons are produced in the resist layer. the secondary electrons are terminated using an additive. the resist layer is developed. the target layer is etched using the developed resist layer as a mask.
